Using OES to measurement of electron temperature of SF6/Ar gas mixture of ICP discharges

Abstract

Abstract Optical emission spectroscopy was used to study the properties of the inductively coupled plasma of SF6/Ar gas mixture. In particular, the effect of RF power supplied to the discharge on the temperature of electrons in the plasma was studied. It was found that the electron temperature gradually decreases with an increase in the RF power. An increase in the RF power from 500 to 750 W leads to a decrease in the electron temperature (Te) of the plasma by about 1.5 times. A qualitative substantiation of the discovered pattern is given.