Author:
Sobolev M S,Ilkiv I V,Lazarenko A A,Mizerov A M,Nikitina E V,Pirogov E V,Timoshnev S N,Baranov A I,Bouravleuv A D
Abstract
Abstract
The growth of monolith GaAsP/Si dual-junction solar cells on Si substrates by molecular-beam epitaxy is demonstrated. The technological method for the formation of a highly doped tunnel p+/n+ junction was developed. An obvious increase in the value of the open-circuit voltage indicating the contribution of the top-junction in the total open-circuit voltage monolithic dual-junction solar cells was found.
Subject
General Physics and Astronomy
Cited by
1 articles.
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