Long and uniform plasma columns generated by linear field-applicators based on stripline technology
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference30 articles.
1. Plasma sources based on the propagation of electromagnetic surface waves
2. Plasma sources using long linear microwave field applicators: main features, classification and modelling
3. A capacitively coupled microplasma (CCµP) formed in a channel in a quartz wafer
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