Planar RF induction plasma coupling efficiency
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference10 articles.
1. Application of a low-pressure radio frequency discharge source to polysilicon gate etching
2. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus
3. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
4. Langmuir probe measurements of a radio frequency induction plasma
5. Ion bombardment energy distributions in a radio frequency induction plasma
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