A comparison of internal plasma parameters in a conventional planar magnetron and a magnetron with additional plasma confinement
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference20 articles.
1. Sputtering systems with magnetically enhanced ionization for ion plating of TiN films
2. Langmuir probe characterization of magnetron operation
3. Diagnostic methods for sputtering plasmas
4. Charged particle fluxes from planar magnetron sputtering sources
5. Electrostatic Probe Measurements in the Glow Discharge Plasma of a D. C. Magnetron Sputtering System
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1. Ion mass-to-charge ratio in planar magnetron plasma with electron injections;Journal of Physics D: Applied Physics;2018-09-05
2. Non-uniform plasma distribution in dc magnetron sputtering: origin, shape and structuring of spokes;Plasma Sources Science and Technology;2015-10-27
3. Velocity distribution of mass-selected nano-size cluster ions;Plasma Sources Science and Technology;2013-06-26
4. Correlations of plasma parameters and properties of magnetron sputtered TiN films;The European Physical Journal Applied Physics;2012-08
5. High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target;Thin Solid Films;2010-11
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