Langmuir probe measurements in the intense RF field of a helicon discharge-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Langmuir probe measurements in the intense RF field of a helicon discharge

Published:2012-09-06 Issue:5 Volume:21 Page:055013
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Chen Francis F

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference27 articles.

1. Principles of Plasma Discharges and Materials Processing

2. The Theory of Collectors in Gaseous Discharges

3. The Collection of Positive Ions by a Probe Immersed in a Plasma

Cited by 34 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics and mechanism of low-field peak in argon helicon plasma of single loop antenna;Physics of Plasmas;2024-08-01

2. Laboratory observation of electron energy distribution near three-dimensional magnetic nulls;Plasma Science and Technology;2023-11-16

3. Plasma sputtering of biased electrodes in an oblique magnetic field;Plasma Sources Science and Technology;2023-09-01

4. Uniform plasma generation with filament assisted DC discharge in a linear plasma device;Physica Scripta;2023-03-27

5. Effect of neutral pressure on the blue core in Ar helicon plasma under an inhomogeneous magnetic field;Plasma Science and Technology;2023-02-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3