High sensitivity ultra-broad-band absorption spectroscopy of inductively coupled chlorine plasma
Author:
Funder
Agence Nationale de la Recherche
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/25/i=3/a=035019/pdf
Reference38 articles.
1. Plasma etching: Yesterday, today, and tomorrow
2. Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy
3. Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing
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5. Atomic chlorine two-photon LIF characterization in a Cl2ICP plasma
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