Nitrogen vibrational excitation in a N2/He pulsed planar-ICP RF discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference44 articles.
1. Large area radio frequency plasma for microelectronics processing
2. Planar Inductively Coupled BCl[sub 3] Plasma Etching of III-V Semiconductors
3. Inductively coupled plasmas in oxygen: Modeling and experiment
4. CF and CF2radical kinetics and transport in a pulsed CF4ICP
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