Langmuir probe studies of a helicon plasma system
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference38 articles.
1. Sensor systems for real-time feedback control of reactive ion etching
2. Diagnostics and control of radio‐frequency glow discharge
3. Plasma characterization and process control diagnostics
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1. Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature;Current Applied Physics;2018-11
2. Resilient Batch-Fabricated Planar Arrays of Miniaturized Langmuir Probes for Real-Time Measurement of Plasma Potential Fluctuations in the HF to Microwave Frequency Range;Journal of Microelectromechanical Systems;2014-10
3. Low temperature deposition of hydrogenated nanocrystalline SiC films by helicon wave plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-09
4. Optimization of Langmuir Probe System Parameters in a Stationary Laboratory Plasma;Plasma Science and Technology;2006-11
5. Plasma characteristics of a high power helicon discharge;Plasma Sources Science and Technology;2006-06-09
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