The role of C2H4for the acetylene chemistry in particle forming Ar/He/C2H2plasmas studied via quantitative mass spectrometry
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference14 articles.
1. The physics and chemistry of dusty plasmas
2. Polymorphous silicon thin films produced in dusty plasmas: application to solar cells
3. Investigations of CH4, C2H2and C2H4dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry
4. Growth precursors and dynamics of dust particle formation in the Ar/CH4and Ar/C2H2plasmas
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Plasma properties and discharging of dust particles in an Ar/C2H2 plasma afterglow;Journal of Physics D: Applied Physics;2024-01-16
2. Nucleation of Carbonaceous Nanoparticles in a Low Pressure Ar/C2H2 Plasma with C2H4 Impurity;The Journal of Physical Chemistry A;2023-08-09
3. Molecular dynamics simulations of reactive neutral chemistry in an argon‐methane plasma;Plasma Processes and Polymers;2022-12-27
4. Time evolution of neutral and charged species in Ar/C2H2 capacitively-coupled RF discharges;Plasma Sources Science and Technology;2022-06-01
5. Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges;Plasma Sources Science and Technology;2021-10-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3