Measurement of electron density in a microdischarge-integrated device operated in nitrogen at atmospheric pressure using a millimetre-wave transmission method-Reference-Cited by-同舟云学术

Measurement of electron density in a microdischarge-integrated device operated in nitrogen at atmospheric pressure using a millimetre-wave transmission method

Published:2010-02-18 Issue:2 Volume:19 Page:025006
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Ito Yosuke,Sakai Osamu,Tachibana Kunihide

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference30 articles.

1. Using a He + N2dielectric barrier discharge for the modification of polymer surface properties

2. Feasibility study of material surface treatment using an atmospheric large-area glow plasma

3. Maskless etching of microstructures using a scanning microplasma etcher

4. Photoresist etching using Ar/O2 and He/O2 atmospheric pressure plasma

5. Deposition of SiOxfilms with a capacitively-coupled plasma at atmospheric pressure

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