Short- and long-term plasma phenomena in a HiPIMS discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference38 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Ionized physical vapor deposition (IPVD): A review of technology and applications
3. Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
4. High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
5. Plasma dynamic in chromium and titanium HIPIMS discharges
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2. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge;Journal of Vacuum Science & Technology A;2023-09-26
3. Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges;Plasma Sources Science and Technology;2023-07-01
4. Ion current density on the substrate during short-pulse HiPIMS;Plasma Sources Science and Technology;2023-07-01
5. Optical emission spectroscopy in deep oscillation magnetron sputtering (DOMS) of titanium;Japanese Journal of Applied Physics;2023-05-15
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