Angular distribution of the ion emission from a tin-based laser-produced plasma extreme ultraviolet source
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference24 articles.
1. Improved reflectance and stability of Mo/Si multilayers
2. 13.5nm extreme ultraviolet emission from tin based laser produced plasma sources
3. Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources
4. Characterization of a 0.25NA full-field EUV exposure tool
5. Filamentation of a surface plasma wave over a semiconductor-free space interface
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2. Energy- and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer;Applied Physics B;2022-06-28
3. Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma;Applied Physics B;2022-02-05
4. Wavelength-dependent variations of the electron characteristics in laser-induced plasmas: A combined hydrodynamic and adiabatic expansion modelling and time-gated, optical emission imaging study;Journal of Applied Physics;2019-02-28
5. Temporally and spatially resolved ion dynamics of droplet-based laser-produced tin plasmas in lateral expansion direction;Journal of Applied Physics;2018-01-28
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