Initiation mechanism of arcing generated in RF capacitively coupled plasma

Abstract

Abstract In our previous study, we established an arcing generation and measurement system and we observed prior light emission before arcing current development. However, we briefly analyzed those light emissions with strong assumptions without detailed experiment evaluations and thus, the investigation of the formation mechanism in the initiation phase with detailed experiment evaluations has yet to be conducted. In this work, we investigated the initiation mechanism of arcing generated on an arcing inducing probe (AIP) in a radio frequency capacitively coupled plasma (CCP) environment. Here, the AIP is an aluminum rod covered by anodized film and its tip edge is partially stripped to localize arcing on this edge. We measured emission light, voltage, and current waveforms induced by arcing. The spatiotemporal image of the emission light revealed that the tip glow is the brightest intensity and has longest lifetime during arcing, meaning that it is the primary process in whole arcing process. The current waveform induced by arcing corresponds to the time evolution of the tip glow and estimations revealed that the electron emission is the predominant component of the current formation. Furthermore, snapshot images with AIPs having enlarged stripping area exhibited that arcing occurs at the boundary between the alnuminum and anodized film (dielectric), where charging of ions from the CCP on the film surface can induce high-electric field. In addition, we found that the energy relaxation length of emitted electrons for collisions with Ar atoms, which are the background gas, is much larger than the tip glow diameter, meaning that the electon-Ar collision cannot maintain tip glow. This result supports additional source of atoms to sustain the tip glow such as the surface evaporation from arcing spot, of which evidence was speculated our previous study. We estimated minimum aluminum vapor density and surface temperature, which is sufficiently high enough to induce surface vaporization. Combining those experiment results and estimations, that are electron emission, high surface temperature, and surface evaporation, we can speculate that the initiation mechanism of arcing near dielectric surface in radio-frequency CCP environment is the thermionic emission and surface evaporation from arcing spot.