Kinetic analysis of 2D Mo2C crystal growth via CVD

Abstract

Abstract We investigated the growth mechanism of 2D Mo2C crystals by chemical vapor deposition (CVD) under various time and temperature conditions. The growth kinetics and mechanism of Mo2C on Cu via chemical vapor deposition (CVD) were investigated using a modified Johnson–Mehl–Avrami–Kolmogorov (JMAK) model. To analyze the surface coverage, we employed scanning electron microscopy (SEM) and applied the modified JMAK model to determine the growth rate and activation energy. The growth rate of Mo2C exhibited temperature-dependent behavior, described by the Arrhenius relationship, with an apparent activation energy of 4 eV. The Avrami plot exhibited an exponent of 3 indicating a complex process with nucleation and growth.