Abstract
Abstract
The low-temperature graphene growth is a crucial step toward more efficient, cost-effective, productive, cheap, and sustainable energy systems. In this work, we report the effect of transition metal nanoparticles (TMNPs) Ag, Pd, and Cu on the graphitization of amorphous carbon (a-C) deposited onto SiO2 substrates using a one-step magnetron sputtering technique at room temperature (RT). Transmission electron microscopy (TEM), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to examine the structures of TMNP-C films. The a-C around the metallic NPs spontaneously formed a disordered graphitic structure. Moreover, the 2D peak was detected in Raman spectra, and XPS analyses revealed the sp2 graphitization for the Ag-C, Pd-C, and Cu-C films deposited on the SiO2 substrates. These studies suggest that these metals’ graphitization activity is in the sequence of Pd > Cu > Ag. The highest catalytic activity of Pd NPs in graphitization at low temperatures was due to the highest carbon solubility and nano-sized particles. Thus, the control of the particle size of the catalyst to enhance the carbon solubility and decrease the melting point will open up a new strategy to grow high-quality graphene at low- temperatures.