Effect of RF-sputtering temperature of ITO electrodes on the resistive switching behaviour of ITO/RbPbI3/Cu devices

Abstract

Abstract In this work, we deposit Indium doped Tin Oxide (ITO) on a glass substrate using the Radio-Frequency Sputtering technique at different temperatures and studied its structural and optical properties. Various structural, optical, and morphological studies are conducted on the ITO substrates. In addition, we have used these ITO films as conducting electrodes in MIM (metal-insulator-metal) type structures for resistive memory application. A resistive switching memory device based on RbPbI3 with sputtered ITO films as the bottom electrode is fabricated and studied for its electrical performance. It has been found that the device showed the write-once-read-many (WORM) nature at a sputtering temperature of 300 °C with a good OFF/ON ratio. The devices with ITO film sputtered a temperature below 300 °C do not show any switching behavior due to lower conductivity and improper surface morphology.