ZnO thin films co-doped with III-valence metals and halogens: theory and experiment

Abstract

Abstract The efficiency of metal-halogen co-doping of ZnO thin films deposited by DC magnetron sputtering of ceramic targets has been studied theoretically and experimentally. The influence of deposition temperature (300 − 900 K range), ZnX2 pressure (10−10−1 atm), Me2O3 dopant concentration (10−3 − 10 mol %), and Zn pressure (10−14 − 10−6 atm) on the composition of ZnO − Me2O3 − ZnX2 − Zn (Me = Al, Ga, In; X = F, Cl, Br, I) systems has been analyzed theoretically. The surface migration velocity of oxides and halides is also estimated for a wide temperature range. According to the calculation results, the optimal deposition conditions have been recommended. ZnO thin films co-doped with Al+Cl, Ga+Cl, Ga+Br, Ga+I, and In+Cl were deposited using ZnO:Me:X ceramic targets sintered by chemical vapor transport based on halides. The influence of the stoichiometric deviation of ceramic targets, the concentration of halogens, and metal impurities on thin films’ electrical, structural, compositional, and optical properties has been investigated. It is shown that Ga+Cl+Zn co-doping is the most promising. This co-doping increases both the structural perfection of films (electron mobility) and doping efficiency by Ga (charge carrier concentration), reducing the resistivity of thin films by two times compared to the use of classical ZnO:Ga ceramic targets. The optimal stoichiometric deviation of ZnO:Me:X ceramics targets, corresponding to the highest electron mobility and figure of merit of thin films, has been recommended.