Wall effects on the chemistry in a pulsed oxygen/silane radiofrequency helicon plasma
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/36/i=17/a=309/pdf
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5. Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition
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