Super-low-kSiOCH film (k= 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Super-low-kSiOCH film (k= 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD

Published:2010-01-29 Issue:6 Volume:43 Page:065203
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Yasuhara Shigeo,Sasaki Toru,Shimayama Tsutomu,Tajima Kunitoshi,Yano Hisashi,Kadomura Shingo,Yoshimaru Masaki,Matsunaga Noriaki,Samukawa Seiji

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. A high performance 0.13 μm copper BEOL technology with low-k dielectric

2. Characterization of Carbon-Doped SiO[sub 2] Low k Thin Films: Preparation by Plasma-Enhanced Chemical Vapor Deposition from Tetramethylsilane

3. An Organic Low-k Film Deposited by Plasma-Enhanced Copolymerization

4. Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature UsingTMS/O2

5. The effect of porogen on physical properties in MTMS–BTMSE spin-on organosilicates

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanochemical Synthesis of Porous Silicon Oxycarbide Composites;Inorganic Materials: Applied Research;2023-06

2. Mechanochemical synthesis of adsorbents based on silicon oxycarbide composites;E3S Web of Conferences;2021

3. Atomic Precision Device Fabrication Using Cyclic Self-Limiting Plasma Processes: Involving Silicon, Silicon Nitride, and Silicon Dioxide;IEEE Nanotechnology Magazine;2019-12

4. 1,3-Dimethoxy-1,3-dimethyl-1,3-diphenyl- and 1,3-dimethoxy-1,3-tetraphenyldisiloxanes: synthesis and structure;Russian Chemical Bulletin;2019-08

5. Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics;Russian Microelectronics;2018-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3