Electron attachment, ionization and drift in c-C4F8
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/34/i=9/a=311/pdf
Reference17 articles.
1. Parameters measurement of ECR C4F8/Ar plasma
2. Insulating gases
3. Electron attachment to perfluorocarbon compounds. III. Fragmentation of aliphatic perfluorocarbons of interest to gaseous dielectrics
4. Ion chemistry in octafluorocyclobutane, c-C4F8
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