An X-ray diffraction profile study in silver films vapour-deposited on a rotating substrate with the axial centre at 44 degrees to the vapour direction-Reference-Cited by-同舟云学术

An X-ray diffraction profile study in silver films vapour-deposited on a rotating substrate with the axial centre at 44 degrees to the vapour direction

Published:1977-07-11 Issue:10 Volume:10 Page:L139-L142
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Sen S,Halder S K,Gupta S P S

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/10/i=10/a=004/pdf

Reference11 articles.

1. The structure and growth of silver films condensed at oblique vapour incidence, and their dependence on the film thickness and the residual air pressure

2. An X-ray diffraction profile analysis of vacuum-evaporated copper films: normal and oblique vapour incidence

3. Influence of deposition conditions and substrate structure on the structure of sputtered tellurium films

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1. An x-ray Fourier line shape analysis of hexagonal tellurium films II: Vacuum evaporated at low temperature (133 K);Thin Solid Films;1984-12

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