Abstract
Single-crystal films of nickel have been deposited in ultra high vacuum under closely
controlled conditions, with a resulting high standard of lattice perfection as
determined by electron microscopy. Anisotropy measurements made by torque
magnetometry yielded the following conclusions:
K
1 has the same value as for bulk nickel (−5·0 × 104
erg cm−3 at room temperature). The magnetostrictive behaviour is
predictable from bulk properties. An estimate of the order of
K
3 is also obtained (−3 × 103 erg cm−3).
K
u can be reduced to extremely low levels by taking steps to
exclude all known mechanisms.
The effect of stress on both K
1 and K
u have been investigated and correlated. A constraint temperature
(about 110°C), well below the substrate temperature during deposition, has
been established.
No contribution to K
u from mechanisms involving oxygen has been observed.
The effects of lattice imperfections are quite marked, and can be the
predominant K
u source.
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
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9 articles.
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