Low-temperature (80 - C) annealing characteristics of LiF:Mg, Cu, P
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/29/i=6/a=028/pdf
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