Enhancement of EUV emission intensity from particles in a droplet by exploding the droplet
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/42/i=15/a=155203/pdf
Reference15 articles.
1. X-ray photoelectron spectroscopy with a laser plasma source
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5. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
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1. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources;Applied Physics Letters;2014-07-28
2. Recent progress in source development for extreme UV lithography;Journal of Modern Optics;2012-06-10
3. RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-21
4. Characteristics of ion debris from laser-produced tin plasma and mitigation of energetic ions by ambient gas;Science China Physics, Mechanics and Astronomy;2012-02-10
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