Photodetachment cross sections of negative halogen ions in discharge media
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/21/i=5/a=002/pdf
Reference32 articles.
1. Fine structure in the dissociative attachment cross sections for HBr and HF
2. Differential cross section for dissociative attachment in HCl: Cl-and H-formation
3. Attachement électronique dissociatif sur HCI et DCI
4. Dissociative attachment of electrons to F2
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1. Electron Interactions with Cl2, CCl2F2, BCl3, and SF6;Fundamental Electron Interactions with Plasma Processing Gases;2004
2. Electron Interactions With Cl2;Journal of Physical and Chemical Reference Data;1999-01
3. Transient signals induced by laser irradiation of negative ions in hollow electrode discharges of Cl2and HCl in N2;Journal of Applied Physics;1990-09-15
4. Electron liberation from negative ions as a means of laser preionization;Journal of Applied Physics;1989-06-15
5. 3.5 Excimer lasers;Laser Systems, Part 1
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