Mechanisms of oxygen plasma damage of amine and methyl terminated organosilicate low-k dielectrics from ab initio molecular dynamics simulations
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/47/i=33/a=335204/pdf
Reference17 articles.
1. Mechanistic study of plasma damage of low k dielectric surfaces
2. Origin of dielectric loss induced by oxygen plasma on organo-silicate glass low-k dielectrics
3. Oxygen radical and plasma damage of low-k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion
4. Plasma damage mechanisms in low k organosilicate glass and their inhibition by Ar ion bombardment
5. Roles of plasma-generated vacuum-ultraviolet photons and oxygen radicals in damaging nanoporous low-kfilms
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