Formation of TiOxfilms produced by high-power pulsed magnetron sputtering-Reference-Cited by-同舟云学术

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Formation of TiOxfilms produced by high-power pulsed magnetron sputtering

Published:2008-02-14 Issue:5 Volume:41 Page:055202
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Straňák Vítězslav,Quaas Marion,Wulff Harm,Hubička Zdeněk,Wrehde Stefan,Tichý Milan,Hippler Rainer

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/41/i=5/a=055202/pdf

Reference25 articles.

1. The Crystal Structure of So-Called delta-Titanium Oxide and Its Structural Relation to the omega-Phases of Some Binary Alloy Systems of Titanium.

2. Disorder and Order in Solid Solutions of Oxygen in alpha-Titanium.

3. Crystallography and defect chemistry of solid solutions of vanadium and titanium oxides

4. Magnetron sputtering of TiOxNy films

5. Microstructure modification of amorphous titanium oxide thin films during annealing treatment

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