Electron attachment properties of c-C4F8O in different environments-Reference-Cited by-同舟云学术

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Electron attachment properties of c-C4F8O in different environments

Published:2016-08-18 Issue:37 Volume:49 Page:375201
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Chachereau A,Fedor J,Janečková R,Kočišek J,Rabie M,Franck C M

Funder

Scientific Exchange Programme (SCIEX)

Swiss National Science Foundation (SNSF)

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/49/i=37/a=375201/pdf

Reference42 articles.

1. Performance of a gas radiator ring imaging Cherenkov detector using multi-anode photomultiplier tubes

2. Global warming gas emission during plasma cleaning process of silicon nitride using c-C[sub 4]F[sub 8]O/O[sub 2] chemistry with additive Ar and N[sub 2]

3. Kinetic theoretical and fluid modelling of plasmas and swarms: the big picture

4. The LXCat project: Electron scattering cross sections and swarm parameters for low temperature plasma modeling

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