Semiconducting ZnO effect on Maxwell–Wagner relaxation in HfO2/ZnO nanolaminates fabricated by atomic layer deposition
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/47/i=50/a=505302/pdf
Reference26 articles.
1. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
2. Interface-controlled high dielectric constant Al2O3/TiOx nanolaminates with low loss and low leakage current density for new generation nanodevices
3. Correlation between giant dielectric response and electrical conductivity of CuO ceramic
4. Maxwell-Wagner space charge effects on the Pb(Zr,Ti)O3–CoFe2O4 multilayers
5. Maxwell–Wagner relaxation in CaCu3Ti4O12/Ag composites
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