Polycrystalline silicon thin films prepared by plasma enhanced chemical vapour deposition at C using fluorinated source gas
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/32/i=3/a=005/pdf
Reference20 articles.
1. Present and future applications of amorphous silicon and its alloys
2. Improvement of n-Type Poly-Si Film Properties by Solid Phase Crystallization Method
3. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
4. Growth of Polycrystalline Silicon Grains
5. Control of nucleation and growth in the preparation of crystals by plasma-enhanced chemical vapour deposition
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2. Nanocrystalline silicon based thin film solar cells;AIP Conference Proceedings;2012
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4. Preparation and characterization studies of nanostructured silicon thin films using rf magnetron sputtering;IOP Conference Series: Materials Science and Engineering;2009-07-01
5. Structural and transport properties of nanocrystalline silicon thin films prepared at 54.24MHz plasma excitation frequency;Journal of Crystal Growth;2007-06
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