Modelling of a self-sustained discharge-excited ArF excimer laser: the influence of photo-ionization and photodetachment by laser light on the discharge development-Reference-Cited by-同舟云学术

Modelling of a self-sustained discharge-excited ArF excimer laser: the influence of photo-ionization and photodetachment by laser light on the discharge development

Published:1995-03-14 Issue:3 Volume:28 Page:445-451
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Akashi H,Sakai Y,Tagashira I

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/28/i=3/a=001/pdf

Reference18 articles.

1. Theoretical simulation of spatial-time characteristics of a discharge XeCl excimer laser active medium

2. Microarcs as a termination mechanism of optical pulses in electric-discharge-excited KrF excimer lasers

3. Modeling of the self-sustained, discharge-excited xenon-chloride laser

4. Theoretical evaluation of the buffer gas effects for a self‐sustained discharge ArF laser

5. Simplified and complex modeling of self-sustained discharge-pumped, Ne-buffered XeCl laser kinetics

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