Reactive DC Magnetron Sputter Deposited Titanium-Copper-Nitrogen Nano-Composite Thin Films with an Argon/Nitrogen Gas Mixture
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference40 articles.
1. Magnetron sputtering of alloy and alloy-based films
2. Effects of Ti on N distribution and diffusion in FeTiN thin films
3. Reactively sputtered Ti–B–N nanocomposite films: correlation between structure and optical properties
4. Structure and properties of hard and superhard Zr–Cu–N nanocomposite coatings
5. Hard nanocomposite Zr–Y–N coatings, correlation between hardness and structure
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1. Correlation between Magnetron Discharge and Characteristics of Alloy (Ti,Cu)N Nano-Structure Thin Films;ECS Journal of Solid State Science and Technology;2016
2. Samarium oxide thin films deposited by reactive sputtering: Effects of sputtering power and substrate temperature on microstructure, morphology and electrical properties;Materials Science in Semiconductor Processing;2015-05
3. Study on the structure, morphology and properties of Fe-doped Cu3N films;Journal of Physics D: Applied Physics;2014-04-17
4. A model for DC magnetron sputtering of bi-component target in Ar ambient: case study of Ti–Cu target;Indian Journal of Physics;2012-09-27
5. Effect of Nitrogen Partial Pressure on Reactive Magnetron Sputtering From Ti13Cu87 Metalloid Target: Simulation of Chemical Composition;Ukrainian Journal of Physics;2012-06-30
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