The Tuned Substrate Self-bias in a Radio-frequency Inductively Coupled Plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference15 articles.
1. Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor
2. Novel high-density plasma tool for large area flat panel display etching
3. Effects of the axial external magnetic field on the reduction of the dielectric window damage due to capacitive coupling in the inductively coupled plasma
4. Ion assisted deposition of thin films by substrate tuned radio frequency magnetron sputtering
5. Control of RF Sputtered Film Properties Through Substrate Tuning
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