Anomalies in the Optical Index of Refraction of Spun Cast Polystyrene Thin Films

Author:

Hu Xuesong,Shin Kwanwoo,Rafailovich Miriam,Sokolov Jonathan1,Stein Richard2,Chan Yee3,Wlwu Kurt Williams4,Wu W L5,Kolb Rainer6

Affiliation:

1. Department of Materials Science and Engineering, State University of New York at Stony Brook, Stony Brook, NY 11794, USA

2. Department of Chemistry and Engineering, University of Massachusetts at Amherst, Amherst, MA 01003, USA

3. Wheatley High School, Old Westbury, NY 11568, USA

4. Veeco Instruments Inc, Plainview, NY 11803, USA

5. National Institute of Standards and Technology, Gaithersburg, MD 20899, USA

6. Exxon Mobile Research and Engineering Company, Annandale, NJ 08801, USA

Abstract

We used x-ray reflectivity in combination with optical ellipsometry to measure the optical index of refraction, n, in thin spun cast polystyrene films. We have found that n is independent of the molecular weight, but is a sharp function of the film thickness for films less than 100 nm. In all cases the deviation from the bulk, Δ n, is negative and varies linearly with wavelength in the visible region. The magnitude of Δ n, was found to be as large as 0.25 for films 7 nm thick. The bulk index of refraction was recovered in all films after annealing for2habove Tg at 160 °C. X-ray reflectivity measurements of the scattering critical angle show minimal density deviations from the bulk (less than 0.5%) between the annealed and unannealed films. Consequently the large molecular-weight-independent value of Δ n is interpreted as being due to a radially symmetric segmental orientation induced by the spinning process.

Publisher

SAGE Publications

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

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