Determination of cathode fall thickness in magnetized dc plasma for argon gas discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/1402-4896/88/i=6/a=065503/pdf
Reference28 articles.
1. Abnormal glow discharges in Ar: experiments and models
2. Study of the Etching Processes of Si [1 0 0] Wafer Using Ultra Low Frequency Plasma
3. Inactivation of Bacteria using Combined Effects of Magnetic Field, Low Pressure and Ultra Low Frequency Plasma Discharges (ULFP)
4. Some fundamental aspects of glow discharges in plasma-assisted processes
5. Energies of particles at the cathode of a glow discharge
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