Spectroscopic Studies of Low Pressure Plasma - Tin and its Compounds
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/1402-4896/33/i=5/a=008/pdf
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1. Hollow Cathode Discharges;Glow Discharge Spectroscopies;1993
2. The study of rf plasma activated processes for stannic oxide thin film deposition;Vacuum;1991-01
3. Spectroscopic study of a pulse plasma used for production and deposition of TiN films;Journal of the Less Common Metals;1990-10
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