Extreme Ultraviolet Spectroscopy of a Laser Plasma Source for Lithography
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/1402-4896/57/i=2/a=023/pdf
Reference19 articles.
1. Laser-produced continua for absorption spectroscopy in the VUV and XUV
2. X-ray production ~13 nm from laser-produced plasmas for projection x-ray lithography applications
3. Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography
4. Repetitively pulsed-plasma soft x-ray source
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