A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing-Reference-Cited by-同舟云学术

A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing

Published:1998-04-01 Issue:4 Volume:57 Page:488-494
ISSN:0031-8949
Container-title:Physica Scripta
language:
Short-container-title:Phys. Scr.

Author:

Bogolyubov E P,Bochkov V D,Veretennikov V A,Vekhoreva L T,Gribkov V A,Dubrovskii A V,Ivanov Yu P,Isakov A I,Krokhin O N,Lee P,Lee S,Nikulin V Ya,Serban A,Silin P V,Feng X,Zhang G X

Publisher

IOP Publishing

Subject

Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics

Link

http://stacks.iop.org/1402-4896/57/i=4/a=003/pdf

Reference10 articles.

1. Plasma focus x-ray source for lithography

2. Neon dense plasma focus point x-ray source for ≤ 0.25 um lithography

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