Visualization of a dual-frequency plasma etch process
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference10 articles.
1. Principal component analysis of plasma harmonics in end-point detection of photoresist stripping
2. Fault Detection for a Via Etch Process Using Adaptive Multivariate Methods
3. Real-time extraction of plasma equilibrium parameters in KSTAR tokamak using statistical methods
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