A thermal processing system for microelectronic materials
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films;Journal of Materials Research;2008-03
2. Effect of Oxidizer on Chemical Vapor Deposited Hafnium Oxide-Based Nanostructures and the Engineering of their Interfaces with Si(100);MRS Proceedings;2007
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