Current limitations of SEM and AFM metrology for the characterization of 3D nanostructures
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Link
http://stacks.iop.org/0957-0233/22/i=9/a=094003/pdf
Reference24 articles.
1. Automated creation of production metrology recipes based on design information
2. Use of Monte Carlo models in the development and validation of CD operators
3. SEM linewidth measurements of anisotropically etched silicon structures smaller than 0.1 µm
4. CD bias reduction in CD-SEM linewidth measurements for advanced lithography
5. CD-bias reduction in CD-SEM line-width measurement for the 32-nm node and beyond using the model-based library method
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Using Nanoscale Passports To Understand and Unlock Ion Channels as Gatekeepers of the Cell;ACS Nano;2024-08-13
2. Nanoscale surface metrology with a liquid crystal-based phase-shifting angular shearing interferometer;Optics Letters;2024-03-20
3. Characterizing planar SERS substrates: unraveling the link between physical characteristics and performance metrics;Journal of Physics: Photonics;2024-02-14
4. In-situ calibration of the objective lens of an angle-resolved scatterometer for nanostructure metrology;Applied Optics;2023-05-10
5. Direct detection of virus-like particles using color images of plasmonic nanostructures;Optics Express;2022-06-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3