Apparatus for Langmuir probe monitoring of plasma during deposition processes
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Link
http://stacks.iop.org/0957-0233/3/i=8/a=003/pdf
Reference20 articles.
1. Reliability of Probe Measurements in Hot Cathode Gas Diodes
2. Dielectric impurities and surface instability in Langmuir probe plasma measurements
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