Characteristics of dual-frequency capacitively coupled SF 6 /O 2 plasma and plasma texturing of multi-crystalline silicon
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/1674-1056/23/6/065201/pdf
Reference32 articles.
1. Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method
2. Surface and bulk-passivated large area multicrystalline silicon solar cells
3. Rie-texturing of multicrystalline silicon solar cells
4. RIE texturing optimization for thin c-Si solar cells in SF6/O2plasma
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2. Spectroscopic Analysis of CF4/O2 Plasma Mixed with N2 for Si3N4 Dry Etching;Coatings;2022-07-27
3. Evolution of electron energy distribution function in capacitively coupled argon plasma driven by very high frequency;Acta Physica Sinica;2016
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