Author:
Wang Cuiling,Zhang Shouheng,Li Shandong,Du Honglei,Zhao Guoxia,Cao Derang
Abstract
Heusler Co2FeSi films with a uniaxial magnetic anisotropy and high ferromagnetic resonance frequency f
r were deposited by an oblique sputtering technique on Ru underlayers with various thicknesses t
Ru from 0 nm to 5 nm. It is revealed that the Ru underlayers reduce the grain size of Co2FeSi, dramatically enhance the magnetic anisotropy field H
K induced by the internal stress from 242 Oe (1 Oe = 79.5775 A⋅m−1) to 582 Oe with an increment ratio of 2.4, while a low damping coefficient remains. The result of damping implies that the continuous interface between Ru and Co2FeSi induces a large in-plane anisotropic field without introducing additional external damping. As a result, excellent high-frequency soft magnetic properties with f
r up to 6.69 GHz are achieved.
Subject
General Physics and Astronomy
Cited by
9 articles.
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