Deposition pressure effect on the surface roughness scaling of microcrystalline silicon films-Reference-Cited by-同舟云学术

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Deposition pressure effect on the surface roughness scaling of microcrystalline silicon films

Published:2010-10 Issue:10 Volume:19 Page:106803
ISSN:1674-1056
Container-title:Chinese Physics B
language:
Short-container-title:Chinese Phys. B

Author:

Zhi-Li Zhu,Yan-Li Ding,Zhi-Yong Wang,Jin-Hua Gu,Jing-Xiao Lu

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Reference15 articles.

1. Gate Overlapped Lightly Doped Drain Poly-Si TFTs Employing 45° Tilt Implant For Source and Drain

2. Microstructures of high-growth-rate (up to 8.3nm/s) microcrystalline silicon photovoltaic layers and their influence on the photovoltaic performance of thin-film solar cells

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1. Polytetrafluoroethylene Sputtered PES Membranes for Membrane Distillation: Influence of RF Magnetron Sputtering Conditions;Plasma Chemistry and Plasma Processing;2016-11-29

2. Monte Carlo study of nanowire magnetic properties;Chinese Physics B;2013-05

3. Influence of Boron doping on microcrystalline silicon growth;Chinese Physics B;2011-09

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