Effect of hydrogen plasma implantation on the micro-structure and magnetic properties of hcp-Co80 57Fe4Ir16 thin films*

Abstract

We present detailed investigations of structural and static/dynamic magnetic properties of hydrogenated hcp-Co80 57Fe4Ir16 soft magnetic thin films. Two different kinds of defects, i.e., destructive and non-destructive, were demonstrated by controlling the negative bias voltage of the hydrogenation process. Our results show that the structure and magnetic properties of our sample can be tuned by the density of the induced defects. These results provide better understanding of the hydrogenation effect and thus can be used in the future for materials processing to meet the requirements of different devices.