Molecular beam epitaxy growth of quantum devices

Abstract

The inherent fragility and surface/interface-sensitivity of quantum devices demand fabrication techniques under very clean environment. Here, I briefly introduces several techniques based on molecular beam epitaxy growth on pre-patterned substrates which enable us to directly prepare in-plane nanostructures and heterostructures in ultrahigh vacuum. The molecular beam epitaxy-based fabrication techniques are especially useful in constructing the high-quality devices and circuits for solid-state quantum computing in a scalable way.