Gas viscosities from a semiconductor-manufacturing mass-flow controller

Abstract

Abstract We obtain gas viscosities with a pressure-based mass-flow controller used for semi-conductor manufacturing, a rate-of-change approach, and a physics-based calculation. The novelty of this method is that it is used in an industrial process whose main goal is not to measure viscosities. In this way, for pressures of the order of 10 kPa and 25 ∘C and 35 ∘C, we obtain for seven gases viscosities with mean absolute errors with respect to reference viscosities of less than 1%. Using this method, we report viscosities for two semiconductor-manufacturing gases not available in the open literature: hexafluoroisobutene (CAS # 382-10-5) and 1,1,3,3,3-pentafluoropropene (690-27-7).