Abstract
Abstract
Atomic oxygen (O) is one of the essential reactive species in plasma oxidation processes. We investigated the behavior of atomic oxygen in a 1 kHz-repetition pulsed plasma jet in atmospheric-pressure He/O2/H2O mixture. By two-photon absorption laser-induced fluorescence, the spatio-temporal profiles of O density were measured under various conditions. In the dry ([H2O]
⩽
100 ppm) condition, the rate of O production did not depend on the [O2] fraction in the range of [O2] = 275–8600 ppm. The analysis of the O-production rate indicates that the atomic oxygen in this plasma jet arises from electron-impact dissociation and quenching of O(1
D), similar to the O-production mechanism in radio-frequency plasma jet. The dependence of O-production in each discharge pulse (Δ[O]) on the discharge energy
E
d
and [O2] in the plasma region at dry condition is formulated as
[
Δ
O
]
(
c
m
−
3
)
/
E
d
(
m
J
)
=
1.3
×
10
15
×
{
1
−
exp
(
−
1.85
×
10
−
17
[
O
2
]
(
cm
-3
)
)
}
. The decay rate of atomic oxygen was not explained by self-recombination or ozone-generation reactions; it was consistent with the reaction rate of O + OH
→
O2 + H at [OH] =
2
×
10
13
cm−3. This result suggests that the small amount of [OH] with 1013 cm−3 density is more responsible for O behavior than [O2] with large fraction of 1015 cm−3. We conducted a chemical reaction simulation considering the measured results of [O] and [OH] production, resulting in good agreement with the spatial distribution of [O]. Chemical reaction analysis revealed that the cyclic reproduction of OH via chain reaction with O and O2 is important, therefore a small amount of OH catalytically consumes atomic oxygen with two-order higher density.
Cited by
1 articles.
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