Spatio-temporal profile of atomic oxygen in a 1 kHz repetition atmospheric-pressure plasma jet in He–O2–H2O mixture

Author:

Nakagawa YusukeORCID,Horibe Hikari,Komuro AtsushiORCID,Ono RyoORCID

Abstract

Abstract Atomic oxygen (O) is one of the essential reactive species in plasma oxidation processes. We investigated the behavior of atomic oxygen in a 1 kHz-repetition pulsed plasma jet in atmospheric-pressure He/O2/H2O mixture. By two-photon absorption laser-induced fluorescence, the spatio-temporal profiles of O density were measured under various conditions. In the dry ([H2O] 100 ppm) condition, the rate of O production did not depend on the [O2] fraction in the range of [O2] = 275–8600 ppm. The analysis of the O-production rate indicates that the atomic oxygen in this plasma jet arises from electron-impact dissociation and quenching of O(1 D), similar to the O-production mechanism in radio-frequency plasma jet. The dependence of O-production in each discharge pulse (Δ[O]) on the discharge energy E d and [O2] in the plasma region at dry condition is formulated as [ Δ O ] ( c m 3 ) / E d ( m J ) = 1.3 × 10 15 × { 1 exp ( 1.85 × 10 17 [ O 2 ] ( cm -3 ) ) } . The decay rate of atomic oxygen was not explained by self-recombination or ozone-generation reactions; it was consistent with the reaction rate of O + OH O2 + H at [OH] = 2 × 10 13  cm−3. This result suggests that the small amount of [OH] with 1013 cm−3 density is more responsible for O behavior than [O2] with large fraction of 1015 cm−3. We conducted a chemical reaction simulation considering the measured results of [O] and [OH] production, resulting in good agreement with the spatial distribution of [O]. Chemical reaction analysis revealed that the cyclic reproduction of OH via chain reaction with O and O2 is important, therefore a small amount of OH catalytically consumes atomic oxygen with two-order higher density.

Funder

JSPS

KAKENHI

Publisher

IOP Publishing

Subject

Condensed Matter Physics

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